On a case-by-case basis we evaluate a possible match between your system requirements and our technology, together with you. In this process we assess the technical feasibility and market potential to ensure a mutually beneficial collaboration.
Typical examples of key parameters in microfocus and nanofocus X-ray sources that may need to be tailored could be spot size, acceleration voltage, electron beam power, focus-to-object distance, X-ray beam angle, X-ray optics and the option of pulsed operation.
Examples for usage of X-ray sources include:
Electron gun and electron beam systems
Currently, our technology supports e-beam systems up to 160 kV and total power up to the kW-range. The electron optics is fully software automated, supporting up to three lenses, enabling for example easy switching between focused e-beams down to 20 nm spot size and collimated e-beams down to 0.02 mRad (depending on power).
Example applications for usage of e-beam systems include:
- Charge neutralization
- Electron imaging (SEM/STEM)
- Electron diffraction (ED)
- Reflection high-energy electron diffraction (RHEED)
- Electron fluorescence
- Plasma excitation
- Radiation studies
- Semiconductor and space research and testing
- Vacuum physics
- X-ray generation
- Electron energy loss spectroscopy (EELS)
- Particle-induced X-ray emission (PIXE)
If you would like to discuss specific details, or if you are just interested in further information about our custom solutions, feel free to get in touch.