On a case-by-case basis we evaluate a possible match between your system requirements and our technology, together with you. In this process we assess the technical feasibility and market potential to ensure a mutually beneficial collaboration.
Typical examples of key parameters in microfocus and nanofocus X-ray sources that may need to be tailored could be spot size, acceleration voltage, electron beam power, focus-to-object distance, X-ray beam angle, X-ray optics and the option of pulsed operation.
In addition, the X-ray source electron target (i.e. anode) may be advantageous to customize in order to optimize the X-ray spectrum, i.e. bremsstrahlung and/or characteristic lines. Here, both MetalJet liquid alloy target composition can be tuned as well as the solid target for both transmission and reflection geometries. Previous custom projects include e.g. development of Aluminium (Al), Copper (Cu) and Tungsten (W) on diamond targets.
Examples for usage of X-ray sources include:
Electron gun and electron beam systems
Currently, our technology supports e-beam systems up to 160 kV and total power up to the kW-range. The electron optics is fully software automated, supporting up to three lenses, enabling for example easy switching between focused e-beams down to 20 nm spot size and collimated e-beams down to 0.02 mRad (depending on power).
Example applications for usage of e-beam systems include:
- Charge neutralization
- Electron imaging (SEM/STEM)
- Electron diffraction (ED)
- Reflection high-energy electron diffraction (RHEED)
- Electron fluorescence
- Plasma excitation
- Radiation studies
- Semiconductor and space research and testing
- Vacuum physics
- X-ray generation
- Electron energy loss spectroscopy (EELS)
- Particle-induced X-ray emission (PIXE)
If you would like to discuss specific details, or if you are just interested in further information about our custom solutions, feel free to get in touch.