Custom products and solutions
For advanced imaging and analytical systems
On a case-by-case basis we evaluate a possible match between your system requirements and our technology, together with you. In this process we assess the technical feasibility and market potential to ensure a mutually beneficial collaboration.
X-ray sources
Typical examples of key parameters in microfocus and nanofocus X-ray sources that may need to be tailored could be spot size, acceleration voltage, electron beam power, focus-to-object distance, X-ray beam angle, X-ray optics and the option of pulsed operation.
Examples for usage of X-ray sources include:
Imaging X-ray methods:
Electron gun and electron beam systems
The Excillum e-beam technology, developed for our MetalJet and NanoTube X-ray source platforms, can also be utilized as a stand-alone e-beam system for electron-based systems.
Currently, our technology supports e-beam systems up to 160 kV and total power up to the kW-range. The electron optics is fully software automated, supporting up to three lenses, enabling for example easy switching between focused e-beams down to 20 nm spot size and collimated e-beams down to 0.02 mRad (depending on power).
Example applications for usage of e-beam systems include:
- Charge neutralization
- Electron imaging (SEM/STEM)
- Electron diffraction (ED)
- Reflection high-energy electron diffraction (RHEED)
- Electron fluorescence
- Plasma excitation
- Radiation studies
- Semiconductor and space research and testing
- Vacuum physics
- X-ray generation
- Electron energy loss spectroscopy (EELS)
- Particle-induced X-ray emission (PIXE)
Contact us
If you would like to discuss specific details, or if you are just interested in further information about our custom solutions, feel free to get in touch.
