Custom products and solutions

For advanced imaging and analytical systems

The technology developed for our standard portfolio of X-ray sources can also be used to create custom products for OEM partners for e g imaging and analytical systems.

On a case-by-case basis we evaluate a possible match between your system requirements and our technology, together with you. In this process we assess the technical feasibility and market potential to ensure a mutually beneficial collaboration.

Excillum custom products

X-ray sources

Typical examples of key parameters in microfocus and nanofocus X-ray sources that may need to be tailored could be spot size, acceleration voltage, electron beam power, focus-to-object distance, X-ray beam angle, X-ray optics and the option of pulsed operation.

Electron gun and electron beam systems

The Excillum e-beam technology, developed for our MetalJet and NanoTube X-ray source platforms, can also be utilized as a stand-alone e-beam system for electron-based systems.

Currently, our technology supports e-beam systems up to 160 kV and total power up to the kW-range. The electron optics is fully software automated, supporting up to three lenses, enabling for example easy switching between focused e-beams down to 20 nm spot size and collimated e-beams down to 0.02 mRad (depending on power).

Example applications for usage of e-beam systems include:

  • Charge neutralization
  • Electron imaging (SEM/STEM)
  • Electron diffraction (ED)
  • Reflection high-energy electron diffraction (RHEED)
  • Electron fluorescence
  • Plasma excitation
  • Radiation studies
  • Semiconductor and space research and testing
  • Vacuum physics
  • X-ray generation
  • Electron energy loss spectroscopy (EELS)
  • Particle-induced X-ray emission (PIXE)

Example of custom product:

Contact us

If you would like to discuss specific details, or if you are just interested in further information about our custom solutions, feel free to get in touch.